Photostabilization of a dibenzoylmethane derivative against UV radiation, useful e.g. for the manufacture of makeup products, by combining with silicated s-triazine compound and bis(resorcinyl) triazine compound

摘要

Process for photostabilization of a dibenzoylmethane derivative against UV radiation, comprises combining a silicated s-triazine compound (I) or its tautomer forms, substituted by two aminobenzoate or aminobenzamide and a bis(resorcinyl) triazine compound, with the dibenzoylmethane derivative. Process for photostabilization of a dibenzoylmethane derivative against UV radiation, comprises combining a silicated s-triazine compound of formula (D)-Si((R)a)-O(3-a)/2 (I) or its tautomer forms, substituted by two aminobenzoate or aminobenzamide and a bis(resorcinyl) triazine compound, with the dibenzoylmethane derivative. R : 1-30C alkyl (optionally halogenated or unsaturated), 6-12C aryl, 1-10C alkoxy or trimethylsilyloxy, preferably -CH3; a : 0-3, preferably 1-2; D : s-triazine compound of formula (II); X : -O- (preferred) or -NR3-; R3H or 1-5C alkyl; R11-20C alkyl (optionally unsaturated and optionally containing Si) or 5-20C cycloalkyl (optionally substituted by 1-3 substituents of 1-4C alkyl, -(CH2CHR4-O)mR5 or -CH2-CH(OH)-CH2-O-R6), preferably 4-5C alkyl, where the group (C=O)XR1 may be in ortho, meta or para position to the amino groups, preferably in para position; R4H or CH3; R5H or 1-8C alkyl; R6H or 4-8C alkyl; m : 2-20; n : 0-2, preferably 0; either R2OH, 1-8C alkyl or 1-8C alkoxy; or R2R21-2C alkylidene dioxy; A : methylene, -CH(Si(CH3)3)-, ethylene, -Z-CH(W1)-CH2-, -Z-CH=CH- or -Z-C=CH2-; Z : 1-10C alkylene diradical (optionally substituted by OH or O and optionally containing amino group), preferably -CH2-; and W1H (preferred), OH or 1-8C alkyl. An independent claim is included for the composition comprises a filtering system in a support, comprising UV filter of dibenzoylmethane derivative, (I) and a bis(resorcinyl)triazine compound. [Image].