Substrate's surface defect detecting method for e.g. electronic field, involves classifying substrate with defects and setting side of substrate, when maximal density of defects is higher or lower than threshold value respectively

摘要

The method involves detecting a defect position on a surface of a semiconductor on insulator type substrate (1). The substrate is classified in a category if total density of defects is higher than a threshold value. Verification is made that maximal density of the defects for a set of zones (SZ) is higher than another threshold value if the total density of the defects is lower or equal to the former value. The substrate with defects (3) at an inner zone (Z) is classified if the verification is satisfied. A side of the substrate is set if the maximal density is lower than latter value. An independent claim is also included for a system for detecting cluster of defects on a surface of a substrate.