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PROCESS CONTROL SYSTEM, METHOD FOR MANAGING PROCESS IMPLEMENTATION DEVICE, METHOD AND PROGRAM FOR MANUFACTURING SEMICONDUCTOR DEVICE

机译:过程控制系统,用于管理过程实现设备的方法,用于制造半导体设备的方法和程序

摘要

PPROBLEM TO BE SOLVED: To provide a process control system etc., which reduces processes of a host computer and facilitates maintenance of programs of the host computer. PSOLUTION: The process control system 21a includes a controller 31a, a stocker 32a, and a processing device 33a. The controller 31a acquires, from a host computer 11, a first information group including information associated with a plurality of processes for manufacturing a product, acquires a second information group including information uniquely generated in at least one of processes implemented in the processing device 33a, and controls the processing device 33a based upon the information of the first group and the information of the second group. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种过程控制系统等,其减少了主机的处理并促进了主机程序的维护。解决方案:过程控制系统21a包括控制器31a,储料器32a和处理装置33a。控制器31a从主计算机11获取第一信息组,该第一信息组包括与用于制造产品的多个处理相关联的信息,并且获取第二信息组,该第二信息组包括在处理装置33a中实现的至少一个处理中唯一地生成的信息。并基于第一组的信息和第二组的信息控制处理装置33a。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009212409A

    专利类型

  • 公开/公告日2009-09-17

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20080055775

  • 发明设计人 SATO TOKUHIRO;SATO GIICHI;

    申请日2008-03-06

  • 分类号H01L21/02;G05B19/418;

  • 国家 JP

  • 入库时间 2022-08-21 19:45:18

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