首页> 外国专利> MANUFACTURING METHOD FOR LIQUID JET APPARATUS, LIQUID JET APPARATUS AND LIQUID JET APPARATUS MANUFACTURING PROGRAM

MANUFACTURING METHOD FOR LIQUID JET APPARATUS, LIQUID JET APPARATUS AND LIQUID JET APPARATUS MANUFACTURING PROGRAM

机译:液体射流装置的制造方法,液体射流装置和液体射流装置的制造程序

摘要

PROBLEM TO BE SOLVED: To solve such a problem that irregularities are generated on a medium when jetting of a liquid is carried out to the medium in an undulate posture.;SOLUTION: A manufacturing method for a liquid jet apparatus which can jet the liquid from each nozzle by driving a piezoelectric element provided for every plurality of nozzles includes the correction information acquiring process of acquiring correction information for each nozzle which is responsive to a difference of distances between each nozzle and the medium to be a jet object of the liquid, and the piezoelectric element driving process of driving the piezoelectric element corresponding to each nozzle by a driving condition conformed to the acquired correction information for each nozzle.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:为了解决以下问题:当以波状姿势向介质喷射液体时,在介质上产生不规则。解决方案:一种能够从中喷射液体的液体喷射装置的制造方法。通过驱动为每个喷嘴设置的压电元件来驱动每个喷嘴,包括校正信息获取过程,该校正信息获取过程获取每个喷嘴的校正信息,该校正信息响应于每个喷嘴与作为液体的喷射对象的介质之间的距离差,并且压电元件的驱动过程,通过与所获取的每个喷嘴的校正信息相符的驱动条件来驱动与每个喷嘴相对应的压电元件。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009166272A

    专利类型

  • 公开/公告日2009-07-30

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20080004043

  • 发明设计人 OKITA KENJI;

    申请日2008-01-11

  • 分类号B41J2/045;B41J2/055;B41J2/01;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:43

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号