PROFILE IRREGULARITY MEASURING AND SURFACE DEFECT OBSERVING APPARATUS, PROFILE IRREGULARITY MEASURING AND SURFACE DEFECT OBSERVING METHOD, AND PROFILE IRREGULARITY AND SURFACE DEFECT INSPECTING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a profile irregularity measuring and surface defect observing apparatus capable of performing profile irregularity measurement of an approximately hemispherical lens with a micro diameter and defect observation of a lens surface with high accuracy using a Fizeau type interferometer, and a profile irregularity measuring and surface defect observing method.;SOLUTION: The apparatus for measuring the profile irregularity of an inspected surface of an inspected lens 7 and observing defects of the inspected surface using the Fizeau type interferometer comprises a light flux control means 8 having a first light flux control plate 8₁ constituted to confirm the position of the inspected lens 7 in adjusting the position of the inspected lens 7, a second light flux control plate 8₂ having an aperture 8₂a at the center and a shielding part 8₂b at the periphery, and a third light flux control plate 8₃ having a shielding part 8₃a at the center and an aperture 8₃b at the periphery, and removably inserting the desired light flux control plate out of these light flux control plates on a virtual plane perpendicular to an optical axis Z₁ of an interferometer optical system including a condensing point P₁ of reflected light from a reference surface 5a of the interferometer optical system.;COPYRIGHT: (C)2009,JPO&INPIT