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RETROFOCUS LENS, PHOTOGRAPHING APPARATUS, AND FOCUSING METHOD OF RETROFOCUS LENS

机译:倒焦镜头,照相装置和倒焦镜头的对焦方法

摘要

PROBLEM TO BE SOLVED: To provide a retrofocus lens which reduces aberration fluctuation in focusing on a near subject of a high photographing magnification, and reduces ghost and flare.;SOLUTION: The retrofocus lens RL comprises a first lens group G1 having negative refracting power, a second lens group G2 having negative refracting power, and a third lens group G3 having positive refracting power. The first lens group G1, the second lens group G2, the third lens group G3 move to a subject side along an optical axis so as to reduce an interval between the second lens group G2 and the third lens group G3 while increasing an interval between the first lens group G1 and the second lens group G2. An antireflective coating is provided on at least one surface out of optical surfaces of the first lens group G1 and the third lens group G3, and the antireflective coating is formed to include at least one layer which is formed by wet process.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:要提供一种后聚焦透镜,该透镜可以减小在高放大倍率附近物体聚焦时的像差波动,并减少重影和眩光。解决方案:后聚焦透镜RL包括具有负屈光力的第一透镜组G1,第二透镜组G2具有负屈光力,第三透镜​​组G3具有正屈光力。第一透镜组G1,第二透镜组G2,第三透镜​​组G3沿着光轴向被摄体侧移动,以减小第二透镜组G2和第三透镜组G3之间的间隔,同时增大第二透镜组G2和第三透镜组G3之间的间隔。第一透镜组G1和第二透镜组G2。在第一透镜组G1和第三透镜组G3的光学表面中的至少一个表面上提供抗反射涂层,并且该抗反射涂层被形成为包括至少一个通过湿法工艺形成的层。 C)2009,日本特许厅

著录项

  • 公开/公告号JP2009069414A

    专利类型

  • 公开/公告日2009-04-02

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20070237088

  • 发明设计人 TANAKA KAZUMASA;YAMAMOTO HIROSHI;

    申请日2007-09-12

  • 分类号G02B13/04;G02B1/11;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:19

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