Being the substrate where it can provide the registration mark in the treatment inside layer where you piled up to the mask, and the device production mannered null substrate which expose manner and the computer program and

摘要

A substrate provided with an alignment mark in a substantially transmissive process layer overlying the substrate, said mark comprising at least one relatively high reflectance area(s) for reflecting radiation of an alignment beam of radiation, and relatively low reflectance areas for reflecting less radiation of the alignment beam, wherein the high reflectance area(s) is (are) segmented in first and second directions both directions being substantially perpendicular with respect to each other so that the high reflectance areas comprise predominantly rectangular segments.