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Cobalt serial alloy electroless deposition solution and electroless deposition method

机译:钴系合金化学沉积溶液及化学沉积方法

摘要

Being superior in stability, several times be able to use, the cobalt serial alloy electroless deposition solution which can prevent the decrease of the membrane by the deposit, it was produced it offers the thin cobalt serial alloy thin film from electroless deposition method and the aforementioned electroless deposition method of using this. The reducing agent dimethylamine borane (dimethylamineborane and DMAB) or the hou hydride (borohydride) is the cobalt precusor, the tungsten precusor and the phosphorus precusor, the reducing agent, the complex compound formation medicine, the pH modifier, and the stabilizer and in the cobalt serial alloy electroless deposition solution which consists of, the stabilizer the cobalt serial alloy electroless deposition solution which features that they are 1 kinds or more which are chosen from the group which consists of the imidazole, thiazole, the triazole, disulfide, and these derivatives, the electroless deposition method of using this and offers the thin film which is produced from now on.
机译:具有优异的稳定性,可多次使用的钴系合金化学沉积溶液,可防止膜层因沉积而减少,它是由化学沉积法和上述方法制备而成的,提供了钴系合金薄膜。使用该方法的化学沉积方法。还原剂二甲胺硼烷(二甲胺硼烷和DMAB)或氢化物(硼氢化物)是钴的先驱体,钨的先驱体和磷的先驱体,还原剂,形成复合物的药物,pH调节剂和稳定剂,在其中由稳定剂组成的钴系合金化学沉积液,其特征在于选自咪唑,噻唑,三唑,二硫化物及其衍生物中的1种以上。 ,使用该方法的化学沉积方法,提供从现在开始生产的薄膜。

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