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Cobalt serial alloy electroless deposition solution and electroless deposition method
Cobalt serial alloy electroless deposition solution and electroless deposition method
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机译:钴系合金化学沉积溶液及化学沉积方法
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摘要
Being superior in stability, several times be able to use, the cobalt serial alloy electroless deposition solution which can prevent the decrease of the membrane by the deposit, it was produced it offers the thin cobalt serial alloy thin film from electroless deposition method and the aforementioned electroless deposition method of using this. The reducing agent dimethylamine borane (dimethylamineborane and DMAB) or the hou hydride (borohydride) is the cobalt precusor, the tungsten precusor and the phosphorus precusor, the reducing agent, the complex compound formation medicine, the pH modifier, and the stabilizer and in the cobalt serial alloy electroless deposition solution which consists of, the stabilizer the cobalt serial alloy electroless deposition solution which features that they are 1 kinds or more which are chosen from the group which consists of the imidazole, thiazole, the triazole, disulfide, and these derivatives, the electroless deposition method of using this and offers the thin film which is produced from now on.
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