首页> 外国专利> Being manner in order can by the mannered null minute etching process substantially for level minute machine structure and the gap adjustment

Being manner in order can by the mannered null minute etching process substantially for level minute machine structure and the gap adjustment

机译:可以通过适当的零分钟刻蚀工艺有条不紊地进行水平微分机的结构和间隙调整

摘要

The present invention relates to a method for adjusting the operating gap of the mechanical elements of the mechanical structure of the two substantially planar obtained by fine etching. Be attributed to (RF) fixed reference position in the direction of the residual gap separating the elements to one element (E) (A), elastically linked by (S) another element method, (OE) stop at least one defining the adjacent gap is the maximum amplitude of the displacement of another element in between (RF) and another element of the (OE) (C), fixed reference position can be connected to the (RF) fixed reference position - placing the block (D), adjacent positions constitute the operating position, until it is smaller than the resolution of fine etching step difference between adjacent gap residual gap to be reduced residual gap elastic link (S) consists of (DE) giving another element (OE) the displacement to antagonize. The present invention is applicable to electromechanical resonator.
机译:本发明涉及一种用于调节通过精细蚀刻获得的两个基本平面的机械结构的机械元件的操作间隙的方法。归因于(RF)在将元素分隔为一个元素(E)(A)的剩余间隙方向上的固定参考位置,通过(S)另一种元素方法进行弹性链接,(OE)停止至少一个定义相邻间隙的位置是(RF)与(OE)(C)之间的另一个元素之间位移的最大幅度,可以将固定参考位置连接到(RF)固定参考位置-放置块(D),相邻位置构成工作位置,直到其分辨率小于精细蚀刻步距,相邻间隙之间的剩余间隙之间的差异将减小,剩余间隙由弹性链节(S)组成(DE)赋予另一元素(OE)对抗作用。本发明适用于机电谐振器。

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