DETECTION/DISCRIMINATION APPARATUS, FOREIGN MATTER DISCRIMINATION METHOD, AND MANUFACTURING METHOD OF SUBSTRATE FOR MASK

摘要

PROBLEM TO BE SOLVED: To provide a detection/discrimination apparatus, capable of rapidly detecting the foreign matters of a substrate and discriminating the types of the foreign matters, using a simple configuration.;SOLUTION: The detection/discrimination apparatus detects foreign matters in the substrate 50 and discriminates the types of foreign matters. The detection/discrimination apparatus comprises detection systems 1, 2, 41 that obtain the position information and image information of foreign matters, by detecting the foreign matters of the substrate; irradiation systems 31, 32, 33, 41 for irradiation of laser beams to the foreign matters detected by the detection system; and discrimination sections 41, 42 for discriminating the types of foreign matters, based on the image information of the regions of foreign matters, before applying laser beams obtained in the detection system and image information of the corresponding regions, after the irradiation of laser beams.;COPYRIGHT: (C)2009,JPO&INPIT