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Decisive manner, exposure manner and the device production manner which decide the program and exposure parameter which makes decision of exposure parameter the computer run.
Decisive manner, exposure manner and the device production manner which decide the program and exposure parameter which makes decision of exposure parameter the computer run.
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机译:决定程序和曝光参数的决定方式,曝光方式和设备生产方式,使曝光参数的决定由计算机运行。
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摘要
An exposure method for exposing a pattern of a reticle which includes a first pattern and a second pattern by using a light from a light source and an optical system includes the steps of obtaining information relating to the first pattern and plural types of representative patterns that can be used for the second pattern, and setting, for the first pattern and the plural types of representative patterns, (i) at least one exposure parameter of the light source and the optical system or (ii) a size or shape of the first pattern and the plural types of representative patterns.
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