It starts drawing the portion of the photoresist coating liquid from the photoresist coating liquid feeder and photoresist coating liquid supply manner, and the buffer

摘要

This invention the photoresist application liquid feeder and application liquid supply method in order to supply the photoresist application liquid whose particle contents are few to the photoresist application device, and used that, it designates that the photoresist application device which can do the application where defect is little, is superior in economical efficiency is offered as purpose. This purpose starts drawing the portion of the application liquid from the buffer container and the aforementioned buffer container of the photoresist application liquid, after filtering, from the circulating filtration equipment for clarifying, and the aforementioned buffer container or the circulating device which are reset into the aforementioned buffer container possessing the piping which the application liquid the sending liquid is done to the application device, by the photoresist application liquid feeder and the photoresist application liquid supply method of using that, and combines the aforementioned application liquid feeder with the slit application device the photoresist application device which become is achieved.