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HIERARCHICAL ANALOG IC PLACEMENT SUBJECT TO SYMMETRY, MATCHING AND PROXIMITY CONSTRAINTS

机译:分层模拟IC放置受对称性,匹配和接近性约束

摘要

A placement tool generates an optimal placement for a plurality of device modules within an analog integrated circuit (IC) subject to device matching, symmetry, and proximity constraints by first defining a multiple-level hierarchy of constraint groups, wherein each constraint group consists of elements that are subject to one of the placement constraints. Each element of each constraint group consists of either of one of the device modules or another one of the constraint groups residing at a lower level of the hierarchy. The tool then generates a hierarchical B*-tree representation of a trial placement for the IC including a separate node representing each constraint group of the hierarchy and a separate node for each of device module not included in any of the constraint groups. Each node representing a constraint group defines relative positions within the IC of each the device modules or lower level constraint groups forming the constraint group that are consistent with the placement constraint on the constraint group. The placement tool iteratively perturbs the hierarchical B*-tree to generate a sequence of trial placements for the IC design and then evaluates a cost function for each trial placement to select a best one of the trial placements as the optimal trial placement.
机译:放置工具通过首先定义约束组的多层层次结构,为模拟集成电路(IC)中受设备匹配,对称性和邻近性约束的多个设备模块生成最佳布局,其中每个约束组由元素组成受到放置限制之一的限制。每个约束组的每个元素由设备模块之一或位于层次结构较低级别的约束组中的另一个组成。然后,该工具为IC生成试验放置的分层B *树表示形式,包括代表分层结构每个约束组的单独节点和未包含在任何约束组中的每个设备模块的单独节点。表示约束组的每个节点定义与约束组上的放置约束一致的,形成约束组的每个设备模块或较低级别约束组在IC内的相对位置。放置工具迭代地扰动分层B *树,以生成用于IC设计的一系列试验放置,然后评估每个试验放置的成本函数,以选择最佳的试验放置之一作为最佳试验放置。

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