PHOTOMASK HAVING CODE PATTERN FORMED BY CODING DATA CONVERSION PROCESS INFORMATION, PHOTOMASK FORMATION METHOD, AND SEMICONDUCTOR DEVICE FABRICATION METHOD

摘要

Design data of a wafer pattern to be formed on a semiconductor wafer is converted into mask data corresponding to a mask pattern to be formed on a photomask for use in the formation of the wafer pattern, and the mask pattern is formed on the photomask on the basis of the mask data. A code pattern obtained by coding information of the data conversion process of converting the design data into the mask data is formed on the photomask.