首页> 外国专利> METHOD OF MANUFACTURING VERTICAL CAVITY SURFACE EMITTING LASER AND METHOD OF MANUFACTURING LASER ARRAY, VERTICAL CAVITY SURFACE EMITTING LASER AND LASER ARRAY, AND IMAGE FORMING APPARATUS WITH LASER ARRAY

METHOD OF MANUFACTURING VERTICAL CAVITY SURFACE EMITTING LASER AND METHOD OF MANUFACTURING LASER ARRAY, VERTICAL CAVITY SURFACE EMITTING LASER AND LASER ARRAY, AND IMAGE FORMING APPARATUS WITH LASER ARRAY

机译:制造垂直腔面激光的方法和制造激光阵列的方法,垂直腔面发射激光和激光阵列以及利用激光阵列的图像形成装置

摘要

A method of manufacturing a vertical cavity surface emitting laser of a mesa structure, the method comprises: sequentially laminating on a substrate a plurality of semiconductor layers including a bottom reflecting mirror, an active layer, a selective oxidation layer and a top reflecting mirror, followed by forming a dielectric film on the laminated semiconductor layers; forming on the dielectric film a first resist pattern comprised of large and small annular opening patterns and large and small annular resist patterns around the same central axis; forming the large and small annular opening patterns in the dielectric film; forming a second resist pattern in the dielectric film so that only the small annular opening pattern is exposed, followed by forming an annular electrode in the exposed small annular opening pattern; and forming a third resist pattern over the annular electrode.
机译:一种制造台面结构的垂直腔表面发射激光器的方法,该方法包括:在衬底上依次层压包括底部反射镜,有源层,选择性氧化层和顶部反射镜的多个半导体层,然后通过在层叠的半导体层上形成电介质膜;在介电膜上形成第一抗蚀剂图案,该第一抗蚀剂图案由围绕同一中心轴的大和小的环形开口图案和大和小的环形抗蚀剂图案组成;在介电膜上形成大,小的环形开口图案;在电介质膜中形成第二抗蚀剂图案,使得仅暴露小环形开口图案,然后在暴露的小环形开口图案中形成环形电极;在环形电极上形成第三抗蚀剂图案。

著录项

  • 公开/公告号US2009196318A1

    专利类型

  • 公开/公告日2009-08-06

    原文格式PDF

  • 申请/专利权人 TATSURO UCHIDA;

    申请/专利号US20090364674

  • 发明设计人 TATSURO UCHIDA;

    申请日2009-02-03

  • 分类号H01S5/026;H01L21;

  • 国家 US

  • 入库时间 2022-08-21 19:32:51

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