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Printed metal mask for UV, e-beam, ion-beam and X-ray patterning
Printed metal mask for UV, e-beam, ion-beam and X-ray patterning
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机译:用于UV,电子束,离子束和X射线图案化的印刷金属掩模
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摘要
A method of forming vias and pillars using printed masks is described. The printed masks are typically made from droplets that include suspended metal nanoparticles. The use of the same metal nanoparticle solution in both the mask formation and the subsequent formation of conducting structures simplifies the fabrication process.
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