Method for formation of thin layers in cryoelectronic by using fulleren C60

摘要

In a process of producing structures using formed thin layers YBCO, which are needed for cryoelectronic, often happens, that used mask in combination with used etching agent will not ensure sufficient quality. Defects of incomplete outline surfaces with residual remains appear, defects in consequence of undercutting shaped motive, etc. The invention solves the problem of producing mask of fullerene C60, which is coating in inverse mask produced by optical lithography by vacuum deposition. The positive mask C60 is produced by lift-off technique from two layers and is able to ensure quality etching in bromoethanol, regarded as best etching agent for YBCO.