PLASMA REACTOR WITH INDUCTIVE EXCITATION OF PLASMA AND EFFICIENT REMOVAL OF HEAT FROM THE EXCITATION COIL

摘要

The plasma reactor of the invention is intended for treating the surfaces of objectssuch as semiconductor wafers and large display panels, or the like, with plasma.The main part of the plasma reactor is an array of RF antenna cells, which are deeplyimmersed into the interior of the working chamber. Each antenna cell has a ferromagneticcore with a heat conductor and a coil wound onto the core. The core and coil are sealedin the protective cap. Deep immersion of the antenna cells having the structureof the invention provides high efficiency of plasma excitation, while the arrangementof the plasma cells and possibility of their individual adjustment provide highuniformity of plasma distribution and possibility of adjusting plasma parameters,such as plasma density, in a wide range.