首页> 外国专利> PRODUCTION PROCESS OF TITANIA-SILICA MIXED CRYSTAL PARTICLES HAVING A HIGH BULK DENSITY, TITANIA-SILICA MIXED CRYSTAL PARTICLES OBTAINED BY THE PROCESS AND USES THEREOF

PRODUCTION PROCESS OF TITANIA-SILICA MIXED CRYSTAL PARTICLES HAVING A HIGH BULK DENSITY, TITANIA-SILICA MIXED CRYSTAL PARTICLES OBTAINED BY THE PROCESS AND USES THEREOF

机译:散装密度高的钛硅混晶颗粒的生产工艺,该工艺获得的钛硅混晶颗粒及其用途

摘要

A process for producing titania-silica mixed crystal particles having a high bulk density and comprising titanium oxide as the main component and silicon oxide as a subsidiary component, the process comprising decomposing a gaseous titanium halide and a gaseous silicon halide, each heated at 600° C., or more in the presence of oxygen or water vapor heated at 600° C. or more, heating the obtained powder at 300 to 600° C. to decrease the concentration of raw material-originated hydrogen halide in the powder to 1 mass % or less, and then subjecting the powder to a treatment of dissociating the aggregated or steric structure.
机译:一种具有高堆积密度并包含氧化钛作为主要成分和氧化硅作为辅助成分的二氧化钛-二氧化硅混合晶体颗粒的制备方法,该方法包括分解分别在600℃下加热的气态卤化钛和气态卤化硅。在600℃以上加热的氧气或水蒸气的存在下,将得到的粉末在300〜600℃下加热,使原料来源的卤化氢的浓度降低至1质量%。 %或更低,然后对粉末进行解离聚集或空间结构的处理。

著录项

  • 公开/公告号EP1587758B1

    专利类型

  • 公开/公告日2008-11-12

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO K.K.;

    申请/专利号EP20030768325

  • 申请日2003-12-26

  • 分类号C01G23/07;C01G23;A61K8;C08K3/36;C09C1/36;H01G9/20;

  • 国家 EP

  • 入库时间 2022-08-21 19:20:27

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