Verfahren zum Bilden eines Katalysators zum Wachsen von Nanoröhrchen/Nanofasern und zum horizontalen Wachsen von Nanoröhrchen/Nanofasern

摘要

The method involves depositing a thin layer (14) with an insulating material, and opening the layer in spaces. A catalyst is deposited on a very thin layer (17), and a conductive material i.e. copper, is deposited on a thick layer (20). An upper part of a structure is eliminated by mechano-chemical polishing until a top stage of the catalyst layer is reached. The catalyst is eliminated with respect to selected flanks of portions of the insulating material, where the catalyst is selected from a group of materials of iron and iron oxides. An independent claim is also included for a method for forming a connection stage of an integrated circuit.