VACUUM COATING UNIT FOR HOMOGENEOUS PVD COATING

摘要

The apparatus (1) comprises a coating chamber (2), two or more cathodes (3), which are arranged peripherally within the coating chamber, substrate carriers (6) for holding the substrate (4), vacuum pumps (8) and voltage sources (15, 16, 17, 18, 19) wherein an individual anode (5) is arranged centrally between the cathodes (3) in the coating chamber (2) and the substrate (4) is positioned between the anode (5) and the cathode (3). In each case a gas discharge with a plasma (14) is ignited between the individual anode (5) and the cathodes (3). The substrates (4) are held fixed in position or are rotated about one or more axes and in the process subjected to the plasma (14).