METHODS FOR DEPOSITING A SILICON LAYER ON A LASER SCRIBED TRANSMITTING CONDUCTIVE OXIDE LAYER SUITABLE FOR USE IN SOLAR CELL APPLICATIONS

摘要

A method for depositing the silicon layer is provided to deposit the silicon layer on the transparent conductive oxide layer which is appropriate for the manufacture of the photovoltaic device. A method for depositing the silicon layer on the TCO(transparency conductivity oxide) layer includes the step for providing the substrate(140) having the transparency conductivity oxide layer placed on the top; the step for positioning the substrate on the substrate support assembly(112) which is arranged within the process chamber; the step for contacting the shadow frame to the peripheral area and the substrate support assembly of the TCO layer; the step for depositing the silicon conductive layer through the hole of the shadow frame on the TCO layer. The TCO layer has the peripheral area and battery integrated domain.