SUBSTRATE TREATMENT APPARATUS FOR USING CHEMICAL AND DEIONIZED WATER IN THE SAME

摘要

A substrate treatment apparatus for using chemical and deionized water in the same are provided to supply a plurality of chemical solutions and DI water at the same time and to reduce the mixing time. The substrate processing apparatus(100) comprises the process bath(106) and cycle line(110). The process bath mixes the hot DI water and/or the chemical supply line(140) and a plurality of chemical solutions provided through the DI water supply line(136) and a plurality of chemical supply sources(120, 122), and the cool DI water supply source(128) and hot DI water supply source(130). The substrate processing apparatus comprises integrating flow meters(124,126,138) and controller(108). The integrating flow meter is installed in chemical supply lines and DI water supply line. The controller measures the supply capacity to supply the chemical solution and DI water.