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SUBSTRATE TREATMENT APPARATUS FOR USING CHEMICAL AND DEIONIZED WATER IN THE SAME

机译:在同一环境中使用化学和去离子水的基质处理设备

摘要

A substrate treatment apparatus for using chemical and deionized water in the same are provided to supply a plurality of chemical solutions and DI water at the same time and to reduce the mixing time. The substrate processing apparatus(100) comprises the process bath(106) and cycle line(110). The process bath mixes the hot DI water and/or the chemical supply line(140) and a plurality of chemical solutions provided through the DI water supply line(136) and a plurality of chemical supply sources(120, 122), and the cool DI water supply source(128) and hot DI water supply source(130). The substrate processing apparatus comprises integrating flow meters(124,126,138) and controller(108). The integrating flow meter is installed in chemical supply lines and DI water supply line. The controller measures the supply capacity to supply the chemical solution and DI water.
机译:提供一种用于在其中使用化学水和去离子水的基板处理设备,以同时供应多种化学溶液和去离子水,并减少混合时间。基板处理设备(100)包括处理槽(106)和循环线(110)。工艺浴将热的去离子水和/或化学药品供应管线(140)以及通过去离子水供应管线(136)和多个化学药品供应源(120、122)提供的多种化学溶液和冷却液混合在一起DI给水源(128)和热DI给水源(130)。基板处理设备包括集成流量计(124,126,138)和控制器(108)。集成流量计安装在化学品供应管线和DI供水管线中。控制器测量供应化学溶液和去离子水的供应能力。

著录项

  • 公开/公告号KR20090036701A

    专利类型

  • 公开/公告日2009-04-15

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20070101876

  • 发明设计人 KANG BYUNG CHUL;AN HYO JUN;

    申请日2007-10-10

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 19:13:40

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