APPARATUS AND A METHOD FOR CLEANING A REAR SIDE OF A PHOTOMASK, MAXIMALLY EXTENDING A REGENERATION CYCLE OF A GROWTH FOREIGN MATERIAL

摘要

PURPOSE: An apparatus and a method for cleaning a rear side of a photomask are provided to remove detachment and reattachment of a pellicle for cleaning using surfactant and ultrapure water.;CONSTITUTION: An apparatus for cleaning a rear side of a photomask includes a photomask support(110) and a surfactant/ultrapure water spray nozzle(120). The photomask support supports the pellicle to make the rear side of the photomask(200) with the pellicle face upward. The surfactant/ultrapure spray nozzle sprays the surfactant/ultrapure water to the rear side of the photo mask.;COPYRIGHT KIPO 2010