METHOD FOR OPTICAL PROXIMITY CORRECT USING CONTROL SIMULATION POINT

摘要

the present invention adjusts the point of the simulation using the optical proximity effect correction method, the transfer wafer to the target pattern of comprising designing the layout; Comprising simulation in the layout of the target pattern designed aerial image (aerial image); Extracting a layout of the image intensity of the simulated aerial image and the target pattern; Confirming the presence or absence of a comparison of the intensity of the image layout of the image intensity of the aerial image and the target pattern to the extracted ripple (ripple); Setting a first point on the simulation of the target pattern layout compared to the intensity of the image including the region confirmed the presence of ripple; Setting a second simulation point to adjust the set point the first simulation; Detecting a position using the second simulated ripple point; Using the location information and the detected ripple includes performing optical proximity correction on the layout.