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METHOD OF GROWTH OF MONO CRYSTALS OUT OF ISOTOPE ENRICHED SILICON

机译:同位素富集硅生长单晶的方法

摘要

FIELD: metallurgy.;SUBSTANCE: invention refers to process of growth of mono crystals of isotope enriched silicon 28Si or 29Si, or 30Si as promising material for production of spin nano-electronics, quantum computers, and radiation-resistant detectors of ionising radiation. The method consists in growth of mono crystals of isotope enriched silicon on mono crystal seed with length L made by the method of crucible-less zone melting; also zone of melt is created by melting the end part of mono crystal seed out of silicon of natural isotope composition with end part of polycrystalline ingot of isotope enriched silicon; further seed is moved along the polycrystalline ingot of isotope enriched silicon at length L corresponding to length of seed and determined from formula , where U is length of melted zone, Ci is concentration of isotope in polycrystalline ingot of isotope enriched silicon, Cn is concentration of isotope in seed out of silicon of natural isotope composition, C is required concentration of isotope at the end of seed, g is ratio of weight of melted zone of seed out of silicone of natural isotope composition to weight of melted zone.;EFFECT: growth of mono crystals of isotope enriched silicon with low predetermined and controlled level of isotope dilution.;1 ex
机译:领域:冶金;实质:发明是指富含同位素的硅 28 Si或 29 Si或 30 Si的单晶的生长过程作为生产自旋纳米电子,量子计算机和电离辐射的耐辐射探测器的有前途的材料。该方法是通过无坩埚区熔化法在长度为L的单晶种上生长富含同位素的硅单晶。另外,通过从天然同位素组成的硅中融化单晶种的端部和富含同位素的硅的多晶锭的端部来形成熔体区。进一步的种子沿着同位素富集的硅的多晶锭沿着与种子长度对应的长度L移动,并根据公式确定。<图像文件=“ 00000004.GIF” he =“ 12” imgContent =“ undefined” imgFormat =“ GIF” wi = “ 53” />,其中U是熔化区的长度,C i 是富含同位素的硅的多晶锭中的同位素浓度,C n 是种子中的同位素浓度在自然同位素组成的硅中,C是种子末端所需的同位素浓度,g是自然同位素组成的硅之外的种子熔化区重量与熔化区重量的比值;效果:单晶的生长同位素稀释的预定浓度和控制水平较低的富含同位素的硅的制备;; 1 ex

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