Micromechanical structure e.g. electrostatic drive, manufacturing method, involves using structures etched in silicon substrate as negative region, removing partial regions of substrate and opening galvanically produced metal structures

摘要

The method involves structuring a silicon substrate (1) by plasma etching process to form silicon structures. The silicon structures etched in the silicon substrate are used as a negative region and are galvanically filled with a metal for forming solid metal structures that are in the form of solid conductive strips and movable contact supports. Partial regions of the silicon substrate are removed by the etching process and the galvanically produced metal structures are opened totally or partially. An independent claim is also included for a micromechanical structure.