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Method for determining polarization-optical characteristic of micro lithographic projection exposure system, involves determining transmission factor of projection lens for both orthogonal polarization directions
Method for determining polarization-optical characteristic of micro lithographic projection exposure system, involves determining transmission factor of projection lens for both orthogonal polarization directions
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机译:确定微光刻投影曝光系统的偏振光学特性的方法,涉及确定两个正交偏振方向的投影透镜的透射系数
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摘要
The method involves determining a transmission factor of a projection lens (24) for both orthogonal polarization directions. The former polarization direction is adjusted before using the polarisator (20) or in a masking plane (18). An intensity measures in an image plane (26) of the projection lens. The latter polarization direction is adjusted before using the polarisator or in the masking plane. Another intensity measures in the image plane of the projection lens. A determined light portion is polarized in the masking plane along the adjusted polarization direction before the polarisator.
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