首页> 外国专利> Method for determining polarization-optical characteristic of micro lithographic projection exposure system, involves determining transmission factor of projection lens for both orthogonal polarization directions

Method for determining polarization-optical characteristic of micro lithographic projection exposure system, involves determining transmission factor of projection lens for both orthogonal polarization directions

机译:确定微光刻投影曝光系统的偏振光学特性的方法,涉及确定两个正交偏振方向的投影透镜的透射系数

摘要

The method involves determining a transmission factor of a projection lens (24) for both orthogonal polarization directions. The former polarization direction is adjusted before using the polarisator (20) or in a masking plane (18). An intensity measures in an image plane (26) of the projection lens. The latter polarization direction is adjusted before using the polarisator or in the masking plane. Another intensity measures in the image plane of the projection lens. A determined light portion is polarized in the masking plane along the adjusted polarization direction before the polarisator.
机译:该方法包括针对两个正交偏振方向确定投影透镜(24)的透射系数。在使用偏光板(20)之前或在掩膜平面(18)中,调整了先前的偏振方向。强度在投影透镜的像平面(26)中测量。在使用偏振镜之前或在掩膜平面中,调整后一个偏振方向。另一强度在投影透镜的像平面中测量。所确定的光部分在偏振器之前沿调整的偏振方向在掩模平面中偏振。

著录项

  • 公开/公告号DE102007038056A1

    专利类型

  • 公开/公告日2009-02-26

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20071038056

  • 发明设计人 FIOLKA DAMIAN;

    申请日2007-08-10

  • 分类号G03F7/20;G02B27/28;G01J4/00;G01M11/02;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:43

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