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Loading and unloading device for silicon wafer, has contact surface sloped relative to horizontal plane such that wafer with outer edges and/or transition surface between edges and plane surfaces of wafer only lies on contact surface
Loading and unloading device for silicon wafer, has contact surface sloped relative to horizontal plane such that wafer with outer edges and/or transition surface between edges and plane surfaces of wafer only lies on contact surface
The device has three centering elements arranged along circumference of a circular path in distributed manner, and moving relative to the circular path in a radial direction by a centering device. A contact surface (6) of the centering elements is sloped relative to horizontal plane (10) such that a wafer (11) with outer edges (14) and/or a transition surface (13) between the edges and plane surfaces (12) of the workpiece only lies on the contact surface, where the workpiece is supported at the contact surface.
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