首页> 外国专利> Very high permittivity dielectric component used at high frequencies, containing lanthanum, strontium and nickel oxide, has specified composition and properties

Very high permittivity dielectric component used at high frequencies, containing lanthanum, strontium and nickel oxide, has specified composition and properties

机译:在高频下使用的极高介电常数电介质成分,包含镧,锶和氧化镍,具有特定的成分和性能

摘要

The composition is expressed by La ( 2 - X )Sr XNiO 4, in which X lies in the range 0 to 0.5 and the relative permittivity epsilon ris no less than 8000 above 10 MHz. Alternatively or in addition, X lies in the range 0 to 0.3 and the relative permittivity epsilon ris no less than 15000. Further variant relative permittivites are quoted, up to 25000. High values of relative permittivity are quoted for frequencies ranging from 10 MHz up to 3 GHz. Values of x are specified in the range 0.05 to 0.3. The component is a lanthanum strontium nickel oxide (LSNO) crystal, especially a single- or poly-crystal. The composition forms a layer manufactured by deposition, especially an amorphous, polycrystalline or microcrystalline layer. The deposition substrate is a semiconductor, wafer, metal or metal foil. An electronic component includes the composition and structure described. It is an active or passive semiconductor component, especially a capacitative element, an element of memory, a rechargeable battery or cell, an energy storage unit, a capacitor or a diode.
机译:组成由La(2-X)Sr XNiO 4表示,其中X在0至0.5的范围内,并且相对介电常数ε在10 MHz以上不小于8000。替代地或附加地,X在0至0.3的范围内并且相对介电常数ε不小于15000。另外的相对介电常数被引用,最高为25000。相对介电常数的高值被引用为频率范围为10MHz至最高。 3 GHz。 x的值规定在0.05至0.3的范围内。该成分是镧锶镍氧化物(LSNO)晶体,尤其是单晶体或多晶体。该组合物形成通过沉积制造的层,特别是非晶,多晶或微晶层。沉积衬底是半导体,晶片,金属或金属箔。电子部件包括所描述的组成和结构。它是有源或无源半导体组件,尤其是电容性元件,存储器元件,可充电电池或单电池,能量存储单元,电容器或二极管。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号