首页> 外国专利> Optical element's e.g. mirror, surface processing method for microlithography, involves radiating fluid in form of fluid beam on surface of optical element which is processed, and moving fluid beam and surface freely in area

Optical element's e.g. mirror, surface processing method for microlithography, involves radiating fluid in form of fluid beam on surface of optical element which is processed, and moving fluid beam and surface freely in area

机译:光学元件例如反射镜,一种用于微光刻的表面处理方法,包括以流体束的形式辐射流体到被处理的光学元件表面,并在区域内自由移动流体束和表面

摘要

The method involves radiating fluid e.g. liquid and gas, in a form of a fluid beam (3) on a surface of an optical element, which is processed. The fluid beam and the surface are moved freely in the area, in six degrees of freedom to each other. The fluid beam is delivered by a stationarily arranged or movable nozzle (2), where fluid covers abrasive components comprising corundum, quartz, diamond, metals, metallic oxides, glass or ceramics. The optical element is designed in a fixed or movable manner. An independent claim is also included for a device for surface processing of optical elements.
机译:该方法涉及例如辐射流体。液体和气体,以光学元件表面上的流体束(3)的形式被处理。流体束和表面在区域内自由移动,彼此具有六个自由度。流体束由固定布置或可移动的喷嘴(2)输送,其中流体覆盖包括刚玉,石英,钻石,金属,金属氧化物,玻璃或陶瓷的磨料成分。光学元件以固定或可移动的方式设计。还包括用于光学元件的表面处理的设备的独立权利要求。

著录项

  • 公开/公告号DE102008042271A1

    专利类型

  • 公开/公告日2009-06-04

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20081042271

  • 发明设计人 THIES HELGE;LOREY ROMY;WANG HEXIN;

    申请日2008-09-22

  • 分类号B24B13/00;B24C1/00;B24C3/32;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:03

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