Surface treatment material for semiconductor manufacture system, comprises a substrate made of aluminum or aluminum alloy, anodic oxidation coating formed over the surface of the substrate with a sealing, and a fluorine-enriched layer

摘要

The surface treatment material for a semiconductor manufacture system, comprises a substrate (2) made of aluminum or aluminum alloy, an anodic oxidation coating (3), which is formed over the surface of the substrate with a sealing, and a fluorine-enriched layer (4), which is formed over the surface of the anodic oxidation coating, where the fluorine concentration in the fluorine-enriched layer is less than 1 wt.%. An independent claim is included for a method for the production of surface treatment material for a semiconductor manufacture system.