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Method of prediction and minimisation of deviations from the OPC model caused by the combination/adaptation of different exposures using a calibrated proprietary decomposition model
Method of prediction and minimisation of deviations from the OPC model caused by the combination/adaptation of different exposures using a calibrated proprietary decomposition model
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机译:预测和最小化使用校准的专有分解模型的不同曝光的组合/适应所导致的与OPC模型的偏差的方法
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摘要
A method for generating models for simulating the imaging performance of a plurality of exposure tools. The method includes the steps of: generating a calibrated model for a first exposure tool capable of estimating an image to be produced by the first exposure tool for a given photolithography process, where the calibrated model includes a first set of basis functions; generating a model of a second exposure tool capable of estimating an image to be produced by the second exposure tool for the photolithography process, where the model includes a second set of basis functions; and representing the second set of basis functions as a linear combination of the first set of basis functions so as to generate an equivalent model function corresponding to the second exposure tool, where the equivalent model function produces a simulated image corresponding to the image generated by the second exposure tool for the photolithography process.
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