首页> 外国专利> PHOTOPROTECTIVE COMPOSITION CONTAINING A PHOTOSENSITIVE 1,3,5-TRIAZINE DERIVATIVE, A DIBENZOYLMETHANE DERIVATIVE, AND S-TRIAZINE SILICATED AND SUBSTITUTED BY TWO AMINOBENZATIC OR AMINOBENZAMIDE GROUPS

PHOTOPROTECTIVE COMPOSITION CONTAINING A PHOTOSENSITIVE 1,3,5-TRIAZINE DERIVATIVE, A DIBENZOYLMETHANE DERIVATIVE, AND S-TRIAZINE SILICATED AND SUBSTITUTED BY TWO AMINOBENZATIC OR AMINOBENZAMIDE GROUPS

机译:包含光敏性1,3,5-三嗪衍生物,二苯甲氧基甲烷衍生物和S-三嗪的光保护性组合物,由两个氨基苯甲酸酯基或氨基苯甲酸酯基取代并取代

摘要

Cosmetic composition comprises a filtering system in a support comprising UV filter of dibenzoylmethane derivative, a UV filter of 1,3,5-triazine i.e. photosensitive in the presence of a dibenzoylmethane derivative and a silicated s-triazine compound (I) or its tautomer forms, substituted by two aminobenzoate or aminobenzamide compound. Cosmetic composition comprises a filtering system in a support comprising UV filter of dibenzoylmethane derivative, a UV filter of 1,3,5-triazine i.e. photosensitive in the presence of a dibenzoylmethane derivative and a silicated s-triazine compound of formula (D)-Si((R) a)-O ( 3 - a ) / 2 (I) or its tautomer forms, substituted by two aminobenzoate or aminobenzamide compound. R : 1-30C alkyl (optionally halogenated or unsaturated), 6-12C aryl, 1-10C alkoxy or trimethylsilyloxy, preferably -CH 3; a : 0-3, preferably 1-2; D : s-triazine compound of formula (II); X : -O- (preferred) or -NR 3-; R 3H or 1-5C alkyl; R 11-20C alkyl (optionally unsaturated and optionally containing Si) or 5-20C cycloalkyl (optionally substituted by 1-3 substituents of 1-4C alkyl, (CH 2CHR 4-O) mR 5 or -CH 2-CH(OH)-CH 2-O-R 6), preferably 4-5C alkyl, where the group (C=O)XR 1 may be in ortho, meta or para position to the amino groups, preferably in para position; R 4H or CH 3; R 5H or 1-8C alkyl; R 6H or 4-8C alkyl; m : 2-20; n : 0-2, preferably 0; either R 2OH, 1-8C alkyl or 1-8C alkoxy; or R 2R 21-2C alkylidene dioxy; A : methylene, -CH(Si(CH3) 3)-, ethylene, alkylene moiety of formula -Z-CH(W 1)-CH 2- or alkene moiety of formula -Z-CH=CH- or -Z-C=CH 2-; Z : 1-10C diradical alkylene (optionally substituted by OH or O and optionally containing amino group), preferably -CH 2-; and W 1H (preferred), OH or 1-8C alkyl. An independent claim is included for the process for improving the stability of a 1,3,5-triazine derivative i.e. photosensitive in the presence of a dibenzoylmethane derivative, in UV radiation comprising addition of the silicated s-triazine compound (I) to the composition. [Image].
机译:化妆品组合物在载体中包含过滤系统,该载体包含二苯甲酰甲烷衍生物的UV滤光剂,1,3,5-三嗪的UV滤光剂,即在二苯甲酰基甲烷衍生物和二氧化硅化的s-三嗪化合物(I)或其互变异构体形式存在下是光敏的被两个氨基苯甲酸酯或氨基苯甲酰胺化合物取代。化妆品组合物包括在载体中的过滤系统,该载体包括二苯甲酰甲烷衍生物的UV滤光剂,1,3,5-三嗪的UV滤光剂,即在二苯甲酰基甲烷衍生物的存在下是光敏的,以及式(D)-Si的二氧化硅化的s-三嗪化合物((a))-O(3-a)/ 2(I)或其互变异构体形式,被两个氨基苯甲酸酯或氨基苯甲酰胺化合物取代。 R:1-30C烷基(任选地卤代或不饱和),6-12C芳基,1-10C烷氧基或三甲基甲硅烷氧基,优选-CH 3; a:0-3,优选1-2; D:式(Ⅱ)的s-三嗪化合物; X:-O-(优选)或-NR 3-; R 3H或1-5C烷基; R 11-20C烷基(可选地不饱和且可选地包含Si)或5-20C环烷基(可选地被1-4C烷基,(CH 2CHR 4-O)mR 5或-CH 2-CH(OH)的1-3个取代基取代-CH 2 -OR 6),优选4-5C烷基,其中基团(C = O)XR 1可以在氨基的邻,间或对位,优选在对位; R 4H或CH 3; R 5H或1-8C烷基; R 6H或4-8C烷基; m:2-20; n:0-2,优选0; R 2OH,1-8C烷基或1-8C烷氧基; R 2R 21-2C亚烷基二氧基;或A:亚甲基,-CH(Si(CH 3)3)-,乙烯,式-Z-CH(W 1)-CH 2-的亚烷基部分或式-Z-CH = CH-或-ZC = CH的烯烃部分2-; Z:1-10C双自由基亚烷基(任选地被OH或O取代并且任选地含有氨基),优选-CH 2-; W 1H(优选),OH或1-8C烷基。对于改善1,3,5-三嗪衍生物的稳定性的方法,包括在二苯甲酰基甲烷衍生物的存在下在紫外辐射下的光敏性,该方法包括向组合物中添加二氧化硅化的s-三嗪化合物(I) 。 [图片]。

著录项

  • 公开/公告号FR2908987B1

    专利类型

  • 公开/公告日2009-01-23

    原文格式PDF

  • 申请/专利权人 LOREAL;

    申请/专利号FR20060055164

  • 发明设计人 DIDIER CANDAU;

    申请日2006-11-28

  • 分类号A61K8/35;A61P17/04;

  • 国家 FR

  • 入库时间 2022-08-21 19:07:34

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