首页> 外国专利> Composition to ensure protection against microbial pollution of cosmetic products, using mixture of pentylene glycol and Acnacidol BG (butylene glycol (and) 10-hydroxydecanoic acid (and) sebacic acid (and) 1,10-decanediol) at lower dose

Composition to ensure protection against microbial pollution of cosmetic products, using mixture of pentylene glycol and Acnacidol BG (butylene glycol (and) 10-hydroxydecanoic acid (and) sebacic acid (and) 1,10-decanediol) at lower dose

机译:使用低剂量的戊二醇和苯甲酸BG(丁二醇(和)10-羟基癸酸(和)癸二酸(和1,10-癸二醇)的混合物)确保化妆品免受微生物污染的成分

摘要

Composition (I) to ensure protection against microbial pollution of cosmetic products, using a mixture of pentylene glycol and Acnacidol BG (RTM: Butylene glycol (and) 10-hydroxydecanoic acid (and) sebacic acid (and) 1,10-decanediol) (a) at a dose lower than 7.5%, is claimed.
机译:组合物(I)使用戊二醇和苯甲酸BG(RTM:丁二醇(和)10-羟基癸酸(和)癸二酸(和)1,10-癸二醇)的混合物来确保防止化妆品受到微生物污染( a)要求剂量低于7.5%。

著录项

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号