首页> 外国专利> MEMS (MICROELECTROMECHANICAL SYSTEMS) MANUFACTURING METHOD AND MEMS

MEMS (MICROELECTROMECHANICAL SYSTEMS) MANUFACTURING METHOD AND MEMS

机译:MEMS(微机电系统)制造方法和MEMS

摘要

PROBLEM TO BE SOLVED: To provide an MEMS having high sensitivity and low temperature dependence.;SOLUTION: In this MEMS manufacturing method, a flexible section and a detecting means for detecting the deformation or displacement of the flexible section by processing two main faces of a silicon wafer from one side are formed; a second wafer made of a connection material of a thermal expansion coefficient close to that of the silicon wafer, as compared with a predetermined metal material is directly jointed to the other of the two main faces of the silicon wafer; the second wafer is etched to form an annular clearance; the connection section surrounded by the clearance and made of the connection material is formed; sacrificial films are formed on the other main face of the silicon wafer, appearing in the clearance and an end surface of the second wafer; and a spindle section made of the metallic material is formed by depositing the metallic material deposit on the surfaces of the connection section and the sacrificial film.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种具有高灵敏度和低温度依赖性的MEMS;解决方案:在该MEMS制造方法中,柔性部分和检测装置通过处理两个主表面来检测柔性部分的变形或位移。从一侧形成硅晶片。将与预定的金属材料相比热膨胀系数接近于硅晶片的连接材料制成的第二晶片直接接合到硅晶片的两个主面中的另一个上;蚀刻第二晶片以形成环形间隙。形成被间隙包围并由连接材料制成的连接部。在硅晶片的另一个主面上形成牺牲膜,该牺牲膜出现在第二晶片的间隙和端面中。并通过在连接部分和牺牲膜的表面上沉积金属材料而形成由金属材料制成的主轴部分。;版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2009264899A

    专利类型

  • 公开/公告日2009-11-12

    原文格式PDF

  • 申请/专利权人 YAMAHA CORP;

    申请/专利号JP20080114084

  • 发明设计人 HATTORI ATSUO;

    申请日2008-04-24

  • 分类号G01P15/12;G01P15/18;G01P9/04;G01C19/56;H01L29/84;H01L41/08;H01L41/187;H01L41/18;H01L41/22;

  • 国家 JP

  • 入库时间 2022-08-21 19:05:51

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