METHOD FOR PRODUCING HIGH REFRACTIVE INDEX SYNTHETIC SILICA GLASS, MUFFLE FURNACE USED IN THE METHOD, AND SILICA GLASS OBTAINED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To decrease the energy loss in the conversion of a silicon reactant compound to the deposited silica as well as to increase the yield of the silica, and to provide silica glass or quartz glass with reduced laser-induced fluorescence (LIF), particularly, in a wavelength range around 651 nm.;SOLUTION: The method for producing synthetic silica glass comprises producing a gas flow containing a fuel, an oxidizer and a gaseous silicon compound in a combustion chamber, and vapor depositing SiO₂ particles onto a target face of a target in the combustion chamber. The gas flow is generated by at least three nozzles consisting of a central nozzle disposed at the front end part of the combustion chamber and for supplying the silicon compound, and a first ring-shaped nozzle for supplying the oxidizer and a second ring-shaped nozzle both disposed concentric to the central nozzle and spaced apart from each other. The method is characterized by a ratio of the second ring gap area to the first ring gap area of from 1:4 to 1:6.1.;COPYRIGHT: (C)2010,JPO&INPIT