首页> 外国专利> Being liquid level position adjustment feature of the monocrystal pulling up device which adjusts the position of the liquid level in order to pull up the monocrystal from the molten liquid surface due to the liquid level

Being liquid level position adjustment feature of the monocrystal pulling up device which adjusts the position of the liquid level in order to pull up the monocrystal from the molten liquid surface due to the liquid level

机译:作为单晶提拉装置的液位位置调节功能,可调节液位的位置,以便由于液位而从熔融液表面提拉单晶

摘要

PROBLEM TO BE SOLVED: To provide an exact liquid level position-adjusting mechanism for pulling a single crystal from the surface of a melt in a Czochralski method.;SOLUTION: Image information are obtained by photographing positions and dimensions of mirror images 11B, 11C of a heat shielding body 11 or the distance between the real image 11A and the central position (distances of central points 12A, 12B and 12C) by using a camera arranged at the outside of a furnace while changing them by moving the level of the melt 2 upward and downward. Then, the changes of the positions and the dimensions or the distances between central positions are measured at a plurality of points from the image information, and the position of the level of the melt is adjusted by using, as a base, a standard point in the image information.;COPYRIGHT: (C)2007,JPO&INPIT
机译:要解决的问题:提供一种精确的液位调节机构,以切克劳斯基方法从熔体表面拉出单晶。解决方案:图像信息是通过拍摄11B,11C镜面的位置和尺寸来获得的隔热体11或实像11A与中心位置之间的距离(中心点12A,12B和12C的距离)通过使用布置在炉子外部的摄像机,同时通过移动熔体的高度来改变它们2向上和向下。然后,根据图像信息在多个点处测量位置和尺寸的变化或中心位置之间的距离,并以在该位置处的标准点为基准调整熔体的高度位置。图片信息。;版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP4561513B2

    专利类型

  • 公开/公告日2010-10-13

    原文格式PDF

  • 申请/专利权人 株式会社SUMCO;

    申请/专利号JP20050213233

  • 发明设计人 高梨 啓一;

    申请日2005-07-22

  • 分类号C30B15/26;

  • 国家 JP

  • 入库时间 2022-08-21 19:02:28

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号