Being manner in order to clean the emission opening periphery of the application head to which production manner and

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning apparatus for a coating head which are used for removing excess highly viscous coating liquid adhering to the periphery of a discharge outlet of a coating head after the coating liquid is discharged out of the discharge outlet of a coating die and which are capable of wiping the coating liquid without leaving any remaining of the coating liquid in the periphery of the discharge outlet of the coating head, constantly keeping the clean state before the application of the coating liquid, and preventing defective coating parts such as vertical stripes in the coated face, and to provide a plasma display and a production method and a production apparatus for producing members of a plasma display. ;SOLUTION: The cleaning method is used for cleaning the periphery of a slit-type discharge outlet of a coating head for discharging a coating liquid out of the discharge outlet and comprises a cleaning step of sliding the periphery of the discharge outlet in the longitudinal direction of the coating head while bringing a cleaning member having a hard cleaning part into linear contact with the periphery and a cleaning step of sliding the periphery of the discharge outlet in the longitudinal direction of the coating head while bringing a cloth into the periphery through a roll having a rotation shaft in the approximately rectangular direction to the longitudinal direction of the coating head.;COPYRIGHT: (C)2001,JPO