Manufacturing method of the optical functional multilayer body and method of manufacturing the optical functional compound semiconductor superlattice structures

摘要

PROBLEM TO BE SOLVED: To provide an optical functional compound semiconductor superlattice structure, multilayered material equipped with optical functionality and methods of manufacturing the structure and material. ;SOLUTION: After a substrate 900 is moved to a position above a deposition chamber 300, Ga is caused to uniformly deposit on the surface of the substrate 900 by exposing the surface to Ga for an arbitrary period of time. Then the substrate 900 is moved to a position above another deposition chamber 200 and exposed to NH₃ for an arbitrary period of time. When the substrate 900 is exposed to the NH₃, one atomic GaN layer is formed on the AlN of the substrate 900. Then Al is caused to deposit on the substrate 900 by moving the substrate 900 to a position above a third deposition chamber 400 and exposing the substrate 900 to TMA for an arbitrary period of time. In addition, the substrate 900 is again moved to the position above the deposition chamber 200, and the surface of the substrate 900 is again exposed to NH₃ for an arbitrary period of time. When the surface is exposed to the NH₃, one atomic AlN layer is formed on the substrate 900. Thereafter, the optical functional compound semiconductor superlattice structure is obtained by alternately laminating several tens to hundreds of atomic GaN layers and several tens to hundreds of atomic AlN layers upon another by repeating the formation of GaN and AlN in prescribed order.;COPYRIGHT: (C)2003,JPO