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The hard anodic oxide coating and its production manner and target null for hard anodic oxide coating formation

机译:硬质阳极氧化膜层及其生产方式和形成硬质阳极氧化膜层的目标靶标

摘要

PROBLEM TO BE SOLVED: To provide a hard film which has hardness higher than that of TiAlN or the conventional (TiAlV)(CN) and has excellent wear resistance, to provide a method of producing the hard film, and to provide a target for forming a hard film which is used therefor.;SOLUTION: The hard film comprises (Tia, Alb, Vc, Sid, Bf)(C1-eNe); wherein, 0.02≤a≤0.5, 0.4b≤0.8, 0.05c, 0≤d≤0.5, 0≤f≤0.1, 0.01≤d+f≤0.5, a+b+c+d+f=1, and 0.5≤e≤1 are satisfied. In this case, a, b, c, d and f are the atomic ratios of Ti, Al, V, Si and B, respectively, and e is the atomic ratio of N.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种具有比TiAlN或常规(TiAlV)(CN)更高的硬度并且具有优异的耐磨性的硬膜,提供一种制造该硬膜的方法,并提供一种形成目标。解决方案:硬膜包括(Ti a ,Al b ,V c ,Si d ,B f )(C 1-e N e );其中,0.02a = 0.5,0.4

著录项

  • 公开/公告号JP4456374B2

    专利类型

  • 公开/公告日2010-04-28

    原文格式PDF

  • 申请/专利权人 株式会社神戸製鋼所;

    申请/专利号JP20040029446

  • 发明设计人 山本 兼司;佐藤 俊樹;

    申请日2004-02-05

  • 分类号C23C14/06;C23C14/24;

  • 国家 JP

  • 入库时间 2022-08-21 18:57:29

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