Deposit coating using atmospheric pressure plasma jet

摘要

(57) Abstract Being operation possible with 760torr, it has shown the example which uses the source which does not put out temperature. As an application example of this invention, two electrodes which are laid out in the same axis (14) the annular condition space between (20), the mixed gas of helium/oxygen grows hoarse the derived bi. The electrode 40 - 500W, Drive with the high-frequency power source of 13.56MHz, the plasma jet which is stabilized starts making. When it detects the optical emission spectrum (OES) with, in the exit of the plasma jet of this main invention, metastability the flow whose oxygen is strong exists, the ion does not exist. The film of two oxidation silicon deposit is done this the tetra- ethoxy silane (TEOS) by introducing in the flow which flows out. When high-frequency power 400W and TEOS 0.2torr and oxygen 11.1torr and helium 748.7torr, capacity of all gas is 41L/min, speed of deposit was 3020250 /min.