Member and a method of forming apparatus radiation-sensitive composition, of silica-based coating film, silica-based coating, the silica-based coating film, as well as insulating film for a photosensitive agent

摘要

A siloxane resin obtained by hydrolytic condensation of a silane compound containing a compound represented by the following general formula (1), (b) component:: (a) component and the solvent for dissolving the component (a), (c) The photosensitive resin composition containing a quinone diazide sulfonic acid ester component. [Equation (1), R ¹ represents an organic group, A is a divalent organic group, X represents a hydrolyzable group, X a plurality in the same molecule may be the same or different. ]