首页> 外国专利> TOTAL REFLECTION ILLUMINATED SENSOR CHIP, METHOD FOR PRODUCING THE TOTAL REFLECTION ILLUMINATED SENSOR CHIP, AND SENSING METHOD USING THE TOTAL REFLECTION ILLUMINATED SENSOR CHIP

TOTAL REFLECTION ILLUMINATED SENSOR CHIP, METHOD FOR PRODUCING THE TOTAL REFLECTION ILLUMINATED SENSOR CHIP, AND SENSING METHOD USING THE TOTAL REFLECTION ILLUMINATED SENSOR CHIP

机译:总反射照明传感器芯片,总反射照明传感器芯片的制造方法以及使用总反射照明传感器芯片的传感方法

摘要

A total reflection illuminated sensor chip is employed in a detecting method for detecting a detection target substance including the steps of: supplying a sample that includes the detection target substance onto a metal film formed on a surface of a dielectric prism, irradiating a measuring light beam onto the interface between the dielectric prism and the metal film such that conditions for total reflection are satisfied at the interface, and utilizing evanescent waves which are generated due to the irradiation of the measuring light beam to detect the detection target substance. Polishing streaks in the region of a metal film formation surface of the dielectric film, on which the metal film is formed, have directional properties with respect to a single direction.
机译:在用于检测被检测物的检测方法中采用全反射照明传感器芯片,该方法包括以下步骤:将包括被检测物的样品供应到形成在电介质棱镜表面上的金属膜上,照射测量光束。在介电棱镜和金属膜之间的界面上,通过使因测量光束的照射而产生的e逝波满足界面上的全反射条件,来检测检测对象物质。在其上形成金属膜的介电膜的金属膜形成表面的区域中的抛光条纹具有相对于单个方向的方向性。

著录项

  • 公开/公告号US2010231915A1

    专利类型

  • 公开/公告日2010-09-16

    原文格式PDF

  • 申请/专利权人 TOSHIHITO KIMURA;

    申请/专利号US20100721303

  • 发明设计人 TOSHIHITO KIMURA;

    申请日2010-03-10

  • 分类号G01N21/55;G01N21/17;B29D11/00;

  • 国家 US

  • 入库时间 2022-08-21 18:56:00

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