首页> 外国专利> PROCESS FOR MANUFACTURING A CHARGE-BALANCE POWER DIODE AND AN EDGE-TERMINATION STRUCTURE FOR A CHARGE-BALANCE SEMICONDUCTOR POWER DEVICE

PROCESS FOR MANUFACTURING A CHARGE-BALANCE POWER DIODE AND AN EDGE-TERMINATION STRUCTURE FOR A CHARGE-BALANCE SEMICONDUCTOR POWER DEVICE

机译:电荷平衡半导体功率器件的制造过程及电荷平衡二极管的制造方法

摘要

An embodiment of a process for manufacturing a semiconductor power device envisages the steps of: providing a body made of semiconductor material having a first top surface; forming an active region with a first type of conductivity in the proximity of the first top surface and inside an active portion of the body; and forming an edge-termination structure. The edge-termination structure is formed by: a ring region having the first type of conductivity and a first doping level, set within a peripheral edge portion of the body and electrically connected to the active region; and a guard region, having the first type of conductivity and a second doping level, higher than the first doping level, set in the proximity of the first top surface and connecting the active region to the ring region. The process further envisages the steps of: forming a surface layer having the first type of conductivity on the first top surface, also at the peripheral edge portion, in contact with the guard region; and etching the surface layer in order to remove it above the edge portion in such a manner that the etch terminates inside the guard region.
机译:制造半导体功率器件的方法的一个实施例设想以下步骤:提供具有第一顶表面的由半导体材料制成的主体;在所述第一顶面附近和所述主体的有源部分内部形成具有第一导电类型的有源区域;并形成边缘终止结构。边缘终止结构由:具有第一类型导电性和第一掺杂水平的环形区域形成,该环形区域设置在主体的外围边缘部分内并且电连接至有源区域;保护区域设置在第一顶表面附近并且将有源区域连接到环形区域,该保护区域具有第一类型的导电性和高于第一掺杂水平的第二掺杂水平。该方法还设想以下步骤:在第一顶表面上,也在外围边缘部分,与保护区域接触,形成具有第一类型导电性的表面层;蚀刻表面层,以便以在蚀刻终止于保护区域内部的方式在边缘部分上方去除表面层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号