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Cleaning composition comprising an alkyl polysaccharide, a nonionic surfactant, a nitrogen containing surfactant-biocide, a polar solvent, a primary amine, chelating agents, an alkaline buffer solution, and an alkoxyaminosilane
Cleaning composition comprising an alkyl polysaccharide, a nonionic surfactant, a nitrogen containing surfactant-biocide, a polar solvent, a primary amine, chelating agents, an alkaline buffer solution, and an alkoxyaminosilane
Disclosed is a cleaning composition comprising: (i) 0.1 to 10 percent by weight of a biofilm removing detergent solution comprising a combination of an alkyl (C 8-18) polysaccharide, a non-ionic surfactant and a nitrogen containing surfactant-biocide; (ii) 2 to 80 percent by weight of one or more polar solvents selected from a primary or secondary alcohol, an ester, an ether, a ketone, a glycol, an aromatic alcohol and cyclic nitrogen solvent containing 8 or less carbon atoms; (iii) 0.5 to 15 percent by weight of one or more primary amines selected from urea, methyl and ethyl urea, mono- di- and triethanolamine, aminomethane, alkylamines containing 1 to 4 carbon atoms, pyridine, paratoludine, tetra (2- hydroxypropyl) ethylene diamine, an aromatic or cyclic amine containing 7 or less carbon atoms; (iv) Two or more chelating agents selected from a substituted di and tri ethylamine, derivatives of phosphonic acid and its substituted derivatives, derivatives of nitrilotriacetic acid, derivatives of gluconic acid, glycine and derivatives thereof; (v) 0.1 to 5.0 percent by weight of an alkaline buffer system providing a pH of about 11.5 to 13.3 in aqueous solution, comprising low molecular weight organic and/or hydroxyl organic acids containing 7 or less carbon atoms and a mono valent alkali; and (vi) 0.005 to 5.0 percent by weight of an alkoxyaminosilane. Also disclosed is the use of the cleaning composition for cleaning, decontaminating, or passivating metallic surgical instruments or equipment.
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