首页> 外国专利> DRYING PROCEDURE FOR SURFACE MOISTURE OF Enamels, Dyes and Serigraphs in CERAMIC TILES AND GLASS BY INFRARED RADIATION.

DRYING PROCEDURE FOR SURFACE MOISTURE OF Enamels, Dyes and Serigraphs in CERAMIC TILES AND GLASS BY INFRARED RADIATION.

机译:红外辐射对陶瓷砖和玻璃中搪瓷,染料和绢画表面水分的干燥程序。

摘要

Surface Moisture Drying Procedureof enamels, inks and serigraphs in ceramic and glass tilesby infrared radiation comprising an enamelling phase, wherea substrate-tile or raw ceramic piece is available,enameled or cooked or glass stand- decorated by enamelsor organic inks and suspensions (3) driven by a line oftransport (1), to pass a radiation drying phaseinfrared, where curing of the applied layer will occurthrough an IR drying tunnel (4) with a set of lampsinfrared mounted on an aluminum reflector stand andcooled by a low pressure fan. Finally, a phaseof preheating for the elimination of possible humidity, by an infrared radiation device (2). This free substrate ofexcess surface moisture will be prepared to receive theink or enamel manually or by a roller applicator,flat head, inkjet printer or guns (3).
机译:表面水分干燥程序陶瓷和玻璃砖中的搪瓷,油墨和丝网印刷通过包含搪瓷相的红外辐射,其中可提供基材砖或未加工的陶瓷片,搪瓷或煮熟的或玻璃架,用搪瓷装饰或有机墨水和悬浮液(3)运输(1),通过辐射干燥阶段红外线,固化后会固化通过带有一组灯的红外干燥通道(4)红外线安装在铝制反射架上,由低压风扇冷却。最后一个阶段预热以消除可能的湿度,方法是红外辐射装置(2)。这种自由的底物表面多余的水分将准备接受手动或通过辊涂机上的墨水或搪瓷,平头,喷墨打印机或喷枪(3)。

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