首页> 外国专利> METHOD OF REMOVING HALOGEN GAS AND REMOVER FOR HALOGEN GAS

METHOD OF REMOVING HALOGEN GAS AND REMOVER FOR HALOGEN GAS

机译:去除卤气和去除卤气的方法

摘要

To provide an agent for removing a halogen series gas and a method for removing a halogen series gas which is excellent in a removing ability of removing the present halogen series gas in a low concentration area, which prevents an adsorbent from generating heat, and which is capable of reducing formation of a solid waste.;A method for removing a halogen series gas, which comprises bringing a gas to be treated which contains at least one member selected from the halogen series gas group consisting of F2, Cl2, Br2, I2, and compounds which generate a hydrogen halide or hypohalogeneous acid upon hydrolysis, into contact with a granule comprising, based on the total mass of the granule, from 45 to 99.85 mass% of an alkali metal salt, from 0.1 to 40 mass% of a carbonaceous material, and from more than 0 mass% to 15 mass% of an alkaline earth metal salt, in the presence of water.
机译:本发明提供一种在低浓度区域中除去本发明的卤素系列气体的除去能力优异,且防止吸附剂发热的,除去卤素能力优异的卤素系列气体的除去剂和卤素系列气体的除去方法。一种去除卤素系列气体的方法,该方法包括引入一种待处理气体,该气体包含至少一种选自以下元素的卤素系列气体:F 2,Cl 2,Br 2,I 2,以及与在水解时产生卤化氢或次卤酸的化合物接触的颗粒,基于颗粒的总质量,其包含45至99.85质量%的碱金属盐,0.1至40质量%的碳质在水的存在下,加入大于0质量%至15质量%的碱土金属盐。

著录项

  • 公开/公告号EP2022553A4

    专利类型

  • 公开/公告日2010-08-04

    原文格式PDF

  • 申请/专利权人 ASAHI GLASS COMPANY LIMITED;

    申请/专利号EP20070741730

  • 发明设计人 SAKURAI SHIGERU;ARIMA HISAKAZU;

    申请日2007-04-16

  • 分类号B01D53/68;B01J20/04;B01J20/20;

  • 国家 EP

  • 入库时间 2022-08-21 18:38:02

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号