RESIST COMPOSITION FOR IMMERSION EXPOSURE WHICH IS HYDROPHOBIC IN CASE OF IMMERSION EXPOSURE AND IS HYDROPHILIC IN CASE OF DEVELOPMENT, AND FORMATION METHOD OF RESIST PATTERN USING IT

摘要

PURPOSE: A resist composition for immersion exposure, and a method for forming a resist pattern by using it are provided to prevent the deterioration of sensitivity, to improve a resist pattern shape and an aging stability in atmosphere, and to reduce the defect of a resist film.;CONSTITUTION: A resist composition for immersion exposure comprises a [fluorine-containing polymer compound] having a unit having a base-dissociable group and a unit represented by the formula f2-1; a base component whose solubility in an alkali developer changes by the action of an acid; and an acid generator component which generates an acid by exposure, wherein R is H, a low molecular weight alkyl group, or a halogenated low molecular weight alkyl group.;COPYRIGHT KIPO 2010