carrier gas heaters and deposition apparatus using the same

摘要

The present invention is heating the carrier gas by a heat sink that is detachable to the gas flow directed to a vapor deposition apparatus, a staggered (zigzag) form of the gas flow path is formed which carrier gas passes, increases the heat contact surface of the carrier gas and a carrier gas heater, forming the path which the carrier gas is moved, and the feed line having a canister for gasification a source material for forming a deposition film and a space in which the source material supplied from the supply line is deposited on the substrate and the chamber to form a, provided with an exhaust line for discharging the remaining source materials and the residual gas in the deposition process is completed the interior of the chamber.